Vacuum-Compatible Imaging System with Variable Working Distances

This project aims to design and develop a cost-effective, configurable, and vacuum-compatible illumination and imaging system tailored for precision metrology in semiconductor environments. The system should support diffraction limited imaging, and variable working distances. The full list of specifications are in the attached PowerPoint file and includes a wavelength from 800 to 875 nm, an NA of 0.032 and a full field of view of 0.85 mm.

***This project is conducting remote interviews. Please visit https://bit.ly/ASML26069 to schedule a time to speak to the sponsor***