Wavefront Performance Measurement on Small NA Lens

Determine the limits of achievable accuracy and repeatability (through extensive analysis and modeling) in measuring wafer topography in a lithography system, using an optical system other than a double-pass interferometer. Quote wavefront error as Zernike polynomials Z2-Z6. Put together a lab setup (such as a single-pass interferometer, Shack-Hartmann Wavefront Sensor, etc.) to demonstrate and verify these levels of accuracy and repeatability.

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