Project number
25042
Organization
ASML US, Inc.
Offering
ENGR498-F2024-S2025
ASML US, Inc. is the world’s only supplier of extreme ultraviolet (EUV) lithography machines, which are crucial for manufacturing the most advanced semiconductor chips. Contaminants that may end up in the system can lead to extended downtime and costly repairs.
As an example, contaminants may arise during the vaporization of tin particles. ASML US, Inc. uses these particles in its laser produced plasma (LPP) EUV lithography tools. A powerful carbon dioxide laser needs to strike the particles at just the right time to produce the EUV light.
This project focused on designing, building and testing an optical metrology module that measures the size, velocity, and particle trajectory of glass soda-lime microspheres with diameters smaller than 500 μm. It used commercial off-the-shelf components supplemented by 3D-printed or locally machined parts. The system comprises a flow control unit, light source, and detector, all housed within a cube no larger than 3 feet per side, with supporting circuitry and display components mounted externally. The metrology module can detect and track particles similar to the ones ASML uses in its LLP EUV lithography processes. The team evaluated the system through iterative testing and collaboration with ASML and demonstrated that the system improved the detection and positioning of microspheres that
are critical for the operation of the LPP EUV tools.
As an example, contaminants may arise during the vaporization of tin particles. ASML US, Inc. uses these particles in its laser produced plasma (LPP) EUV lithography tools. A powerful carbon dioxide laser needs to strike the particles at just the right time to produce the EUV light.
This project focused on designing, building and testing an optical metrology module that measures the size, velocity, and particle trajectory of glass soda-lime microspheres with diameters smaller than 500 μm. It used commercial off-the-shelf components supplemented by 3D-printed or locally machined parts. The system comprises a flow control unit, light source, and detector, all housed within a cube no larger than 3 feet per side, with supporting circuitry and display components mounted externally. The metrology module can detect and track particles similar to the ones ASML uses in its LLP EUV lithography processes. The team evaluated the system through iterative testing and collaboration with ASML and demonstrated that the system improved the detection and positioning of microspheres that
are critical for the operation of the LPP EUV tools.