Project number
25042
Organization
ASML US, Inc.
Offering
ENGR498-F2024-S2025
Project Description:
Design, build, and bench test an optical metrology module that measures the size, velocity, and particle trajectory of microspheres with diameters <500um.
Background:
ASML in Rancho Bernardo, CA develops EUV (Extreme Ultra Violet, 13.6 nm radiation) lithography light sources for EUV lithography tools using LPP (Laser Produced Plasma) technology. EUV generation takes place inside a large diameter (>1.5 m) chamber by vaporizing/ionizing small liquid Sn (Tin) droplets at high repetition rates (50 kHz) using a powerful CO2 laser. The vaporized/ionized Sn droplets produce EUV radiation which is collected by a mirror and focused into a lithographic scanner. The scanning system exposes lithographic patterns on semiconductor wafers using the EUV light.
During EUV source operation, the Sn droplet stream passes through a light curtain (for example, a light curtain produced by a laser beam). The reflected light from the curtain is collected by a solid state detector whose signal is used to fire a powerful CO2 laser at the “proper time” to vaporize/ionize each Sn particle in the stream – thus producing EUV light.
Problem and Capstone Statement (using microspheres):
The detection of Sn particles and their position in space at a given time is critical to the operation of the LPP EUV source system. It is desirable to produce a metrology system that measures the size, velocity, and trajectory of moving particles – microspheres.
The project task is to design and build a prototype system using commercial off-the-shelf parts, supplemented by 3D-printed or locally-machined parts, to deliver a unit that will be tested on a U of A test bench. The approximate size of the system (metrology unit) consisting of the microsphere launch system, light source, and detector should fit inside a cube of no more than 3ft on each side – additional circuitry for collecting and displaying outputs need not be included in the contained metrology unit. Further details will be explored by the team during conversations with ASML leads.
******This sponsor will not be present at Open House. If interested, please sign up for an interview slot here - https://bit.ly/ASML25042******
Design, build, and bench test an optical metrology module that measures the size, velocity, and particle trajectory of microspheres with diameters <500um.
Background:
ASML in Rancho Bernardo, CA develops EUV (Extreme Ultra Violet, 13.6 nm radiation) lithography light sources for EUV lithography tools using LPP (Laser Produced Plasma) technology. EUV generation takes place inside a large diameter (>1.5 m) chamber by vaporizing/ionizing small liquid Sn (Tin) droplets at high repetition rates (50 kHz) using a powerful CO2 laser. The vaporized/ionized Sn droplets produce EUV radiation which is collected by a mirror and focused into a lithographic scanner. The scanning system exposes lithographic patterns on semiconductor wafers using the EUV light.
During EUV source operation, the Sn droplet stream passes through a light curtain (for example, a light curtain produced by a laser beam). The reflected light from the curtain is collected by a solid state detector whose signal is used to fire a powerful CO2 laser at the “proper time” to vaporize/ionize each Sn particle in the stream – thus producing EUV light.
Problem and Capstone Statement (using microspheres):
The detection of Sn particles and their position in space at a given time is critical to the operation of the LPP EUV source system. It is desirable to produce a metrology system that measures the size, velocity, and trajectory of moving particles – microspheres.
The project task is to design and build a prototype system using commercial off-the-shelf parts, supplemented by 3D-printed or locally-machined parts, to deliver a unit that will be tested on a U of A test bench. The approximate size of the system (metrology unit) consisting of the microsphere launch system, light source, and detector should fit inside a cube of no more than 3ft on each side – additional circuitry for collecting and displaying outputs need not be included in the contained metrology unit. Further details will be explored by the team during conversations with ASML leads.
******This sponsor will not be present at Open House. If interested, please sign up for an interview slot here - https://bit.ly/ASML25042******